Submitting Campus
Daytona Beach
Department
Mechanical Engineering
Document Type
Report
Publication/Presentation Date
2-2004
Abstract/Description
Adsorbed surface contaminants on optical elements absorb light energy in an optical lithography system and, if left unclean, will result in reduced wafer yield. In order to nondestructively analyze the surface adsorbate of different CaF2 samples, a laser induced desorption-Time of Flight Mass Spectrometer (LID-TOFMS) technique was developed. The main object of this technique is to investigate the surface composition of adsorbed contaminants as a function of position on the sample. An Er:YAG laser at 2.94 μm was used as the light source to induce desorption. Electron impact ionization was used to obtain ionization of desorbed molecules. The detection of ionized species was accomplished by TOFMS operated in Angular Reflectron (AREF) mode to obtain better resolution.
The data reported here can be used in semiconductor industries either to modify conventional processing or to design a new efficient laser cleaning process for optical elements.
Sponsorship/Conference/Institution
Sensors Directorate, Air Force Research Laboratory, Air Force Materiel Command
Location
Wright Patterson AFB, OH
Paper Number
AFRL-SN-WP-TR-2004-1054
Number of Pages
108
Scholarly Commons Citation
Allen, S. D., & Surpaneni, Y. (2004). Laser Induced Desorption Time of Flight Mass Spectrometer Analysis of Adsorbed Contaminants on Vacuum Ultraviolet Lithography Optic Materials. , (). Retrieved from https://commons.erau.edu/publication/1263
Additional Information
Dr. Allen was not affiliated with Embry-Riddle Aeronautical University at the time this report was published.
This report is also a thesis submitted to the Department of Electrical and Computer Engineering in partial fulfillment of the requirements for the degree of Master of Science for author Yamini Surpaneni.